Thermal and UV-imprint with high resolution

Resolution up to 20 nm with pattern transfer

Alignment accuracy: 0.5 µm or better

Samples are typically 1, 2 inch in diameter, the maximum size is 6 inch

Pressure up to 50 bar for thermal imprint

Commonly used technique: IPS-STU process

Thermal imprint and UV-assisted replication processes

Jenoptic HEX 03 hot press

Pressing force 200kN

Embossing temperature up to 320°C

Molding of thermoplastic polymers with resolution <10 nm

Optical alignment with 3 μm overlay accuracy for double sided aligned embossing

4" wafers and chips, normally 1x1 or 2x2 mm²

Flux measurement before exposures

Embossing under vacuum

Spin-coater, wet-bench, hot-plates, microscope

Thermal and UV-Nano Imprinting Lithography

Automatic lab presse Webber PW equipped with an external electro-hydraulic supply station

Automatic lab UV press equipped together with an integrated pneumatic supply station

Max Press force: 35 kN

Temperature range: 18-300°C

Primary exposure wavelength: 254 nm

Samples: 6” plates

Vacuum imprint tool with integrated heater

The system is equipped with an external electro-hydraulic supply station. Press and supply station are connected with hydraulic tubes and quick lock components. Water cooling system.

Two-hand safety control panel, security protection device, rise of pressure adjustable, additional manometer, hand pump, pressure release valve, digital display PRESSTRONIC for force- and pressure-sensors for exact reading of the press force easier.  Peak storage and a serial PC-interface

Thermal imprint with high resolution

Imprint by air to achieve high resolution and uniformity

1-80bar pressure and up to 350ºC

Resolution up to 20 nm with pattern transfer

Samples from 2mm x 2mm up to 4 inch

Temperature and Pressure control and monitoring

Spinners and hot-plates for resist preparation