Scientific highlights | NFFA.eu

Scientific highlights

High-resolution resist-free lithography for nanoporous thin films

Researchers at KU Leuven (Belgium) and from the TU Graz’s (TUG) outstation Austrian SAXS beamline c/o ELETTRA - Sincrotrone Trieste (Italy) developed a high-resolution resist-free lithography process to pattern metal-organic framework (MOF) films.

FROM OUR JOINT RESEARCH

Block co-polymer lithography is made available at NFFA Europe for large area nano-patterning

NFFA Europe offers block copolymer lithography for the fabrication of large area patterns with sub-20 nm resolution along with accurate methods for guiding the self-assembly

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World Record: 7 nm Resolution in Scanning Soft X-ray Microscopy

With newly developed Fresnel zone plates, researchers from PSI, DESY, and Soleil reached 7 nm resolution in scanning soft X-ray microscopy

Printing 3D superconducting nanohelices using a Helium microscope

Fabrication of superconducting nanohelices using He+ focused beam induced deposition at the Centre de Nanosciences et de Nanotechnologies.

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Atomic scale microscopy at video rate: FastSTM experiments for NFFA-Europe users

Scanning tunneling microscopy up to 100 frames per seconds allows imaging dynamical processes on surfaces at the atomic scale

Altering properties of transition metal dichalcogenides by bi-intercalation

Advanced synchrotron radiation spectroscopy at the IOM-CNR laboratory in Trieste helped to gain insight into the origins of phase transitions in Cu and Ni doped TiSe₂ dichalcogenide.

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Platinum Forms Nano-Bubbles

Technologically important noble metal oxidises more readily than expected

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GISAXS alignment aids based on mesoporous silica thin films available for users

Mesoporous silica films, having ordered structure, can be employed as reference samples to align GISAXS stages. They could also be used as sample supports to deliver fluids through porosity. The activity has been conducted at the TUG facility in Trieste.

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Unveiled the catalytic action of single nickel adatoms in the growth of graphene layers

In a report published in Science, scanning tunneling microscopy at video-rate and ab-initio calculations demonstrate that nickel atoms act as single catalysts for graphene growth.

Direct-write method to grow individual and 3D superconducting hollow nanowires

Fabrication of the smallest superconducting hollow nanowire by He+ focused beam induced deposition at the Centre de Nanosciences et de Nanotechnologies.

Current conduction mechanism and electrical break-down in InN grown on GaN

Current conduction mechanisms, including electron mobility, drift velocity and electrical break-down have been investigated in MBE-grown InN layers at the Foundation for Research and Technology Hellas.

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Plasma etching and pyrolysis contribute to size reduction of laser polymerized 3D structures

Researchers within NFFA Europe develop processes enabling fabrication of sub 100 nm smallest features sizes in free form 3D structures.

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Deep neural networks lead to nanoscience images classification software

A research group leaded by CNR-IOM in Trieste trained a deep neural network to recognize different types of Scanning Electron Microscopy (SEM) images

Self-texturizing electronic properties of a 2-dimensional GdAu₂ layer on Au(111): the role of out-of-plane atomic displacement

We demonstrate the spontaneous patterning of the electronic properties of a 2-dimensional layer

One step preparation of ZnFe₂O₄/Zn₅(OH)₆(CO₃)₂ nanocomposite with improved As(V) removal capacity

High magnification SEM images obtained in ICMAB/CSIC facilities provided a better view of the morphological characteristics of a ZnFe2O4/Zn5(OH)6(CO3)2 nanocomposite.

Atomic-to-microscale evaluation of large-area two-dimensional metal dichalcogenides for microelectronics

Understanding the process-structure-property relationship from bulk to atomic scale is crucial for developing and optimizing the fabrication process for novel electronic materials especially in the field two-dimensional transition metal dichalcogenide layers, which exhibit unique properties down to one-atomic thickness.

INDUSTRY CORNER

Enquiry into an industrial user experience at NFFA-Europe

Dorian Martin interviews Alex Robinson from Irresistible Materials Ltd

Metal Enhanced Resists for EUV Lithography

The last 50 years have seen great progress in the field of microelectronics through continuous improvement of manufacturing techniques to enable the fabrication of smaller and more complex components. However, there is increasing difficulty in maintaining progress due to the resolution limitations of 193 nm wavelength photolithography. Next generation lithography techniques such as extreme ultraviolet lithography (EUV) have been developed to facilitate further miniaturisation, but will required novel chemical approaches for the photoresist that records the pattern.

Magnetoelectricity in La_2-xSr_xNiO₄

Magnetoelectric effect (ME) can efficiently be defined as the phenomenon of the inducing magnetic moment, by applying an external electric (magnetic field) field, of the induction of electric polarization upon the presence of an external magnetic field.

Scientific Highlight

Catalysis in a nanoparticle

Getting insight into structural changes of the surfaces of the nanoparticle during a catalytic reaction. A pioneering experiment within the Joint Research Activities of NFFA-Europe.