PSI
Paul Scherrer Institut

The site offer

Tools available @ laboratories

Lithography & Patterning

Installation 1
EBL Electron Beam Lithography
Electrochemical deposition
ICP Inductively Coupled Plasma
NIL NanoImprint Lithography
RIE Reactive Ion Etching
t-SPL Thermal Scanning Probe Lithography
Two-photon Lithography
UV/EUV-IL Ultra Violet/Extreme UV - Interference lithography
UVL Ultra Violet Lithography

Growth & Synthesis

Installation 2
ALD Atomic Layer Deposition
CVD Chemical Vapour Deposition
Thermal processes

Characterisation

Installation 4
AFM Atomic Force Microscopy
Optical Thin Film Metrology
SEM Scanning Electron Microscopy
STM Scanning Tunneling Microscopy
Installation 5
FTIR Fourier Transform Infra Red Spectroscopy and Spectromicroscopy
Optical spectroscopy
XPS X-ray Photoelectron Spectroscopy
Installation 6
Magnetic/ferroelectric/dielectric char.
MOKE Magneto-Optic Kerr Effect

Tools available @ Large Scale Facilities

Characterisation

Installation 5
ARPES Angle Resolved Photoelectron Spectroscopy
IR spectroscopy UHV reflection-absorption IR spectroscopy
IXS Inelastic X-ray Scattering
XAS X-ray Absorption Spectroscopy
XPD/RESPES/RESPED Resonant Photoemission Spectroscopy/Diffraction
XPEEM/SPEM PhotoEmission Microscopy
XPS X-ray Photoelectron Spectroscopy
Installation 6
XMCD/XMLD X-ray Magnetic Circular/Linear Dichroism
Installation 4
XRD X-Ray Diffraction
XRM X-Ray Microscopy
Europe flag This research project has received funding from the EU's H2020 framework programme for research and innovation under grant agreement n. 654360 from 1/9/2015 to 31/8/2020
For more information please contact secretariat@nffa.eu data policy  -  privacy & cookies